![Copper Sputter Target [Cu] CF Tee SA00010 In development Onboard RS485](https://cdn.shopify.com/s/files/1/0117/2714/2969/products/CuTarget.jpg?v=1539227820)
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SA00010 In development Onboard RS485 data protocol
These ball valves have an NW-KF vacuum flange for connection to the vacuum system
is recommended for use at ambient temperatures
They are made of corrosive resistant 304L stainless steel
Available External manifold (8-way)
Copper Sputter Target [Cu] CF Tee SA00010 In development Onboard RS485Copper Sputter Target used for Magnetron Sputtering Physical Vapour Deposition. Various diameters, thicknesses and purities available to suit all major sputter source manufacturers. If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation. All our materials are tested using ICP OES chemical analysis and manufactured under ISO9001: 2008 certification. Materials are vacuum packed under cleanroom
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